SE100
Multi-functional Thin Film Measurement Instrument
3D optical profiler with an integrated scanning platform for surface structure and coating uniformity. Collect spatially resolved height data across a defined sample area so local features can be related to broader process patterns.
Multi-Parameter Thin Film Measurement for R&D
SE100 is a laboratory thin-film measurement platform for applications where film thickness needs to be evaluated together with optical properties. Instead of treating thickness as a standalone parameter, SE100 provides several optical outputs within one measurement workflow.
Measurement Outputs : Film thickness, Reflectance, Transmittance, Refractive index (n), Extinction coefficient (k), Band gap, Photoluminescence
Why Multi-Parameter Measurement? : Film thickness can explain how much material has been deposited. Optical parameters provide additional information about how the film interacts with light. Combining these measurements can help researchers compare process conditions and understand changes in thin-film behavior.
Typical Applications : Semiconductor films, Perovskite PV, Display materials, Optical coatings, Thin-film R&D, Process development
Measurement Workflow : Sample → Optical Measurement → Thickness / Optical Properties → Data Comparison → Process Optimization
